Reticle and Wafer Inspection System: Simultaneous Dual Sided Inspection
![Self-Contained Reticle Inspection System](images/reticle-wafer-inspection-1s.jpg)
![WIS wafer inspection system](images/reticle-wafer-inspection-2s.jpg)
![Dual-Sided wafer Inspection](images/reticle-wafer-inspection-3s.jpg)
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Now available from Syntec, a WIS wafer inspection system that has simultaneous high-throughput, double-sided inspection of photo masks. It can be easily modified to support other substrates. Accommodate wafers up to 8 inches.
Our original concept was based on scattering measurements from multiple lasers. The optical platform consisted of a separate reticle chamber with controlled airflow to eliminate any possibility of instrument-generated particle contamination. Since that time, our concept has continuously improved to increase sensitivity, eliminate laser diodes, and increase throughput.
Our latest Model PDS-1020G2 incorporates all these improvements in a reduced footprint design.
- Complete Self-Contained Reticle Inspection System
- Simultaneous Back Glass/Front Pellicle Inspection
- Interface/Control: Ethernet TCP/IP
- Internal Linear Stage (No Spinning of Reticle)
- Area CCD Array Provides High Sensitivity and Low Distortion
- Scattered Light from Defects Is Detected by High-Sensitivity CCD Camera
- Background and Pattern Recognition Algorithms (option) Minimize Pattern Clutter
- Dual-Pass Inspection Available for Maximum Sensitivity
- Inspection Area: Automatic or Multiple User-Definable Regions-of-Interest
- Pellicle Frame Shape: Automatic or User-Definable
- Defect Size Classification Programmable: From 1µm to 100µm