Now available from Syntec, a WIS wafer inspection system that has simultaneous high-throughput, double-sided inspection of photo masks. It can be easily modified to support other substrates. Accommodate wafers up to 8 inches.

Our original concept was based on scattering measurements from multiple lasers. The optical platform consisted of a separate reticle chamber with controlled airflow to eliminate any possibility of instrument-generated particle contamination. Since that time, our concept has continuously improved to increase sensitivity, eliminate laser diodes, and increase throughput.

Our latest Model PDS-1020G2 incorporates all these improvements in a reduced footprint design.

• Complete Self-Contained Reticle Inspection System
• Simultaneous Back Glass/Front Pellicle Inspection
• Interface/Control: Ethernet TCP/IP
• Internal Linear Stage (No Spinning of Reticle)
• Area CCD Array Provides High Sensitivity and Low Distortion
• Scattered Light from Defects Is Detected by High-Sensitivity CCD Camera
• Background and Pattern Recognition Algorithms (option) Minimize Pattern Clutter
• Dual-Pass Inspection Available for Maximum Sensitivity
• Inspection Area: Automatic or Multiple User-Definable Regions-of-Interest
• Pellicle Frame Shape: Automatic or User-Definable
• Defect Size Classification Programmable: From 1µm to 100µm